The NFCF supports the fabrication and characterization of nanoscale materials and structures, and integration of devices at all length scales. The facility houses advanced equipment with core nano-level (20 nm or below) capability for fabrication and characterization, including electron-beam lithography system, dual-beam system, plasma etching, thin film deposition, TEM, multifunctional scanning probe station, modular XRD, and more (see Facilities and Equipment).
