Original Concept

The Nanoscale Fabrication and Charaterization Facility was opened in the fall of 2006 but the original concept was first made available at a virtual groundbreaking in March of 2004.  Below are images from the virtual groundbreaking contrasted with images of the current facility.

Original Concept 1Fabrication Now

Above: Lithography room in the Fabrication Area

EBeam LithEBL

Above:  Electron Beam Lithography

XRD OriginalXRD

Above:  X-ray Diffraction System in the Characterization area

All original concept photos are courtesy of Kenneth M. Sochats.