Original Concept
The Nanoscale Fabrication and Charaterization Facility was opened in the fall of 2006 but the original concept was first made available at a virtual groundbreaking in March of 2004. Below are images from the virtual groundbreaking contrasted with images of the current facility.
Above: Lithography room in the Fabrication Area
Above: Electron Beam Lithography
Above: X-ray Diffraction System in the Characterization area
All original concept photos are courtesy of Kenneth M. Sochats.
