Heidelberg MLA100 Direct Write Lithographer

Heidelberg MLA100 Direct Write Lithographer

The Heidelberg Direct Write Lithography system is a flexible, high resolution photolithography tool for direct writing.  The MLA100 automatically detects the perimeter of the sample and uses a digital mask to sequentially expose smaller pattern fields to yield a unified design. ……………………………………………………………………………………………………………………………………………………………………………………………………………………………..

Key Features

• Minimum feature size down to 1 µm
• Non-contact exposure
• Substrates up to 5” x 5”
• Light source at 365nm
• Alignment accuracy of 500nm
• Multiple data input formats

Key Applications and available processes

Fast patterning of masks and wafers in Life Science, MEMS, Micro-Optics, Semiconductor, Sensors, Actuators, Materials Research 

General Documentation

MLA100 system SOP (standard operation procedure)

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