Electron Beam Lithography (EBL)
Raith ‘e-LiNE’ Ultra high resolution Electron Beam Lithography e_LiNE
This EBL is a versatile e-beam system for nano structuring, pattern inspection, dimensional metrology and nano engineering. The e-LiNE electron optical column matches perfectly with a number of key applications in CNT research, thin film engineering, photonic crystals and EBID.
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Existing User? Link to FOM here.
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Supervisor: Matt France
Co-Supervisor: Mike McDonald
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